Progress in Nanotechnology and Nanomaterials          
Progress in Nanotechnology and Nanomaterials(PNN)
Frequency: Quarterly

About the Journal

Progress in Nanotechnology and Nanomaterials (PNN) is a multidisciplinary peer-reviewed journal covering fundamental and applied research in all disciplines of science, engineering and medicine. PNN publishes all aspects of nanoscale science and technology dealing with materials synthesis, processing, nanofabrication, nanoprobes, spectroscopy, properties, biological systems, nanostructures, theory and computation, nanoelectronics, nano-optics, nano-mechanics, nanodevices, nanobiotechnology, nanomedicine, nanotoxicology. This journal offers an international platform for experts, researchers and scholars to communicate, explore, and discuss knowledge in the field of nanotechnology.

With the dream that our each and every reader around the world can have equal and free access to our ever growing knowledge pool, WAP adheres to the Open Access principles, under which, everyone can get full journal article contents from our website without registration or any kind of charge. The belief is deeply rooted in our organization that none of what WAP has achieved today would ever be made possible without your support and contribution, and it is with great appreciation you would continue to play an important and invaluable role in our academic community as a reader, author, editor or just to spread the words.

Journal News:
PNN now is a member of CrossRef and has joined CrossCheck to fight against plagiarism. Ensure high ethical standards for all of the submitted papers.

Current Issue
Development of a New Process for the Manufacture of Nanostructured Particles for UV Filter Encapsulation
Adriano M. Oliveira1, Natália N.P. Cerize1, Fernanda C.P. Ferreira1, Juliana N. Schianti1, Wagner Aldeia1
1.Bionanomanufacturing Center, Institute for Technological Research, 532, 05508-901, Sao Paulo, Brazil
Abstract | References Full Paper: PDF (Size:647KB), pp.64-72, Pub. Date: 2014- 10-09

Towards the Universal Transport Properties of Metal/Insulator Granular Thin Films in the Low-Field Regime with Increasing Bias Potential or Current
M.A.S. Boff1, B. Canto1, F. Mesquita1, R. Hinrichs2, L.L. Araujo1, D.L. Baptista3, F.P. Luce1, P.F.P. Fichtner4, G.L.F. Fraga1, L.G. Pereira1
1.Physics Institute–IF-UFRGS, C.P. 15051, 91501–970, Porto Alegre, RS, Brazil
2.Geosciences Institute–IG-UFRGS, C.P. 15001, 91501–970, Porto Alegre, RS, Brazil
3.Materials Metrology Division, INMETRO, 25250–020 Duque de Caxias, RJ, Brazil
4.Engineering School–UFRGS, C.P. 15051, 91501–970, Porto Alegre, RS, Brazi
Abstract | References Full Paper: PDF (Size:2255KB), pp.73-78, Pub. Date: 2014- 10-09

Carbon Nanotubes in Engineering Applications: A Review
Pavan Krishnama Naidu1, Narasimha Vinod Pulagara1, Raja Sekhar Dondapati1
1.School of Mechanical Engineering, Lovely Professional University, Punjab, India
Abstract | References Full Paper: PDF (Size:239KB), pp.79-82, Pub. Date: 2014- 10-09